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Hokkaido University Collection of Scholarly and Academic Papers
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article (author version)
Akazawa, Masamichi
;
Kitajima, Shouhei
;
Kitawaki, Yuya
Control of plasma-CVD SiO2/InAlN interface by N2O plasma oxidation
-
Japanese Journal of Applied Physics (JJAP)
-
1-Oct-2019
article (author version)
Akazawa, Masamichi
;
Kitajima, Shouhei
Control of plasma-CVD SiO2/InAlN interface by ultrathin atomic-layer-deposited Al2O3 interlayer
-
Japanese Journal of Applied Physics (JJAP)
-
1-Aug-2019
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