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TypeAuthor(s)TitleOther TitlesCitationCitation(alt)Issue Date
articleShimozuma, M.; Tochitani, G.; Ohno, H.; Tagashira, H.; Nakahara, J.Hydrogenated amorphous carbon films deposited by low-frequency plasma chemical vapor deposition at room temperature-Journal of Applied Physics-1-Jul-1989
article (author version)Ishibashi, Y.; Mishina, T.; Nakahara, J.Intermolecular interaction of carbon disulfide under pressure (high pressure and effective negative solvation pressure)-Physica Status Solidi (B)-16-Mar-2006
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