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Preparation of double layer film of boron and carbon by pulsed laser deposition

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Title: Preparation of double layer film of boron and carbon by pulsed laser deposition
Authors: Suda, Yoshiyuki1 Browse this author →KAKEN DB
Suganuma, Y. Browse this author
Sakai, Y. Browse this author
Suzuki, K. Browse this author
Tsujino, J. Browse this author
Homma, N. Browse this author
Authors(alt): 須田, 善行1
Keywords: Amorphous carbon
Boron
Pulsed laser deposition
X-ray photoelectron spectroscopy
Field emission
Issue Date: 30-Sep-2002
Publisher: Elsevier
Journal Title: Applied Surface Science
Volume: 197-198
Start Page: 603
End Page: 606
Publisher DOI: 10.1016/S0169-4332(02)00405-1
Abstract: Double layer films of boron and carbon were prepared by pulsed laser deposition (PLD) on silicon substrates. The film surface morphology was examined by atomic force microscopy (AFM). The chemical composition of the elements, carbon, boron, silicon and oxygen, and bonding state of carbon atoms as a function of the depth from the film surface were analyzed by X-ray photoelectron spectroscopy (XPS) with argon ion sputtering technique. Carbon atoms bonded to boron (C---B) were observed as well as carbon atoms bonded to carbon (C---C).
Relation: http://www.sciencedirect.com/science/journal/01694332
Type: article (author version)
URI: http://hdl.handle.net/2115/10509
Appears in Collections:情報科学院・情報科学研究院 (Graduate School of Information Science and Technology / Faculty of Information Science and Technology) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 須田 善行

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