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Preparation of double layer film of boron and carbon by pulsed laser deposition
Title: | Preparation of double layer film of boron and carbon by pulsed laser deposition |
Authors: | Suda, Yoshiyuki1 Browse this author →KAKEN DB | Suganuma, Y. Browse this author | Sakai, Y. Browse this author | Suzuki, K. Browse this author | Tsujino, J. Browse this author | Homma, N. Browse this author |
Authors(alt): | 須田, 善行1 |
Keywords: | Amorphous carbon | Boron | Pulsed laser deposition | X-ray photoelectron spectroscopy | Field emission |
Issue Date: | 30-Sep-2002 |
Publisher: | Elsevier |
Journal Title: | Applied Surface Science |
Volume: | 197-198 |
Start Page: | 603 |
End Page: | 606 |
Publisher DOI: | 10.1016/S0169-4332(02)00405-1 |
Abstract: | Double layer films of boron and carbon were prepared by pulsed laser deposition (PLD) on silicon substrates. The film surface morphology was examined by atomic force microscopy (AFM). The chemical composition of the elements, carbon, boron, silicon and oxygen, and bonding state of carbon atoms as a function of the depth from the film surface were analyzed by X-ray photoelectron spectroscopy (XPS) with argon ion sputtering technique. Carbon atoms bonded to boron (C---B) were observed as well as carbon atoms bonded to carbon (C---C). |
Relation: | http://www.sciencedirect.com/science/journal/01694332 |
Type: | article (author version) |
URI: | http://hdl.handle.net/2115/10509 |
Appears in Collections: | 情報科学院・情報科学研究院 (Graduate School of Information Science and Technology / Faculty of Information Science and Technology) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)
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Submitter: 須田 善行
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