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Co-deposition of Al-Cr-Ni alloys using constant potential and potential pulse techniques in AlCl3-NaCl-KCl molten salt

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タイトル: Co-deposition of Al-Cr-Ni alloys using constant potential and potential pulse techniques in AlCl3-NaCl-KCl molten salt
著者: Ueda, Mikito 著作を一覧する
Kigawa, Hirokuni 著作を一覧する
Ohtsuka, Toshiaki 著作を一覧する
キーワード: Molten salt
Co-deposition
Aluminum alloy
Electroplating
Pulse electrolysis
発行日: 2007年 2月 1日
出版者: Elsevier
誌名: Electrochimica Acta
巻: 52
号: 7
開始ページ: 2515
終了ページ: 2519
出版社 DOI: 10.1016/j.electacta.2006.09.001
抄録: To improve the oxidation resistance of TiAl intermetallic compound under high temperature condition, cathodic co-deposition of Al-Cr and Al-Ni alloy was carried out by constant potential control or potential pulse control in AlCl3-NaCl-KCl molten salt containing CrCl2 and/ or NiCl2 at 423 K. Cathodic reduction of Ni and Cr starts at potential of 0.8 and 0.15 V vs. Al/Al3+ in the molten salt, respectively. The co-deposition of Al, Cr, and Ni occurred at potentials more negative than -0.1 V to form a mixture of intermetallic compounds of Cr2Al, Ni3Al, and Al3Ni. Concentration of Cr in the deposit was enhanced to 43 at% at –0.1V; however, concentration of Ni in the deposit was 6 at% at the same potential. The concentration of Ni further decreased with more negative potential to 1 at% at -0.4 V. The potential pulse technique enhanced the Ni concentration in the deposit to about 30 at%, due to anodic dissolution of Al content from the deposit at the higher side of potential on the potential pulse electrolysis.
Relation (URI): http://www.sciencedirect.com/science/journal/00134686
資料タイプ: article (author version)
URI: http://hdl.handle.net/2115/20439
出現コレクション:雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

提供者: 上田 幹人

 

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