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Photoanodic formation of an organic monolayer on a hydrogen-terminated Si(111) surface via Si–C covalent bond using a Grignard reagent and its application for one-step monolayer-patterning

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Title: Photoanodic formation of an organic monolayer on a hydrogen-terminated Si(111) surface via Si–C covalent bond using a Grignard reagent and its application for one-step monolayer-patterning
Authors: Takakusagi, Satoru Browse this author →KAKEN DB
Miyasaka, Toyomitsu Browse this author
Uosaki, Kohei Browse this author
Keywords: Semiconductor electrode
Photoelectrochemistry
Grignard
Organic monolayer
Silicon
Patterning
Issue Date: 15-Jan-2007
Publisher: Elsevier
Journal Title: Journal of Electroanalytical Chemistry
Volume: 599
Issue: 2
Start Page: 344
End Page: 348
Publisher DOI: 10.1016/j.jelechem.2006.06.004
Abstract: Alkyl monolayer (octadecyl) was formed on a hydrogen-terminated Si(1 1 1) (H–Si(1 1 1)) electrode via Si–C covalent bond by photoanodic reaction with C18H37MgCl in THF solution. The formation of the organic monolayer was confirmed by attenuated total reflection (ATR) FT-IR spectroscopy. This process was applied to a one-step patterning of an organic monolayer on a H–Si(1 1 1) by illuminating the H–Si(1 1 1) electrode through photomask in a C18H37MgCl/THF solution at positive potential. The formation of the pattern reflecting the shape of the photomask was confirmed by SEM observations.
Relation: http://www.sciencedirect.com/science/journal/00220728
Type: article (author version)
URI: http://hdl.handle.net/2115/20537
Appears in Collections:理学院・理学研究院 (Graduate School of Science / Faculty of Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 魚崎 浩平

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