Photoanodic formation of an organic monolayer on a hydrogen-terminated Si(111) surface via Si–C covalent bond using a Grignard reagent and its application for one-step monolayer-patterning


Hokkaido University \| Library \| HUSCAP	Advanced Search		言語

	Home
	About HUSCAP
	Open Access Policy

	Browse by Author

Browse
	Communities & Collections

	Scholarly Journals
	Theses
	Doctoral Dissertations Listed by Graduate Schools
	Conference Procs.
	Events

	HUSCAP Senior (in Japanese)

	Societies

	Downloads (country)

For university staff
	How to post your papers to HUSCAP
	Publication of theses
	Helpline about theses publication

Open Archives Compliant

You can search our collection also at:
	Google
	Google Scholar
	CiNii
	IRDB
	OAIster
	NDLTD

Files in This Item:

jec-599-2-344.pdf

459.66 kB

PDF

Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/20537

Title:	Photoanodic formation of an organic monolayer on a hydrogen-terminated Si(111) surface via Si–C covalent bond using a Grignard reagent and its application for one-step monolayer-patterning
Authors:	Takakusagi, Satoru Browse this author →KAKEN DB
	Miyasaka, Toyomitsu Browse this author
	Uosaki, Kohei Browse this author
Keywords:	Semiconductor electrode
	Photoelectrochemistry
	Grignard
	Organic monolayer
	Silicon
	Patterning
Issue Date:	15-Jan-2007
Publisher:	Elsevier
Journal Title:	Journal of Electroanalytical Chemistry
Volume:	599
Issue:	2
Start Page:	344
End Page:	348
Publisher DOI:	10.1016/j.jelechem.2006.06.004
Abstract:	Alkyl monolayer (octadecyl) was formed on a hydrogen-terminated Si(1 1 1) (H–Si(1 1 1)) electrode via Si–C covalent bond by photoanodic reaction with C18H37MgCl in THF solution. The formation of the organic monolayer was confirmed by attenuated total reflection (ATR) FT-IR spectroscopy. This process was applied to a one-step patterning of an organic monolayer on a H–Si(1 1 1) by illuminating the H–Si(1 1 1) electrode through photomask in a C18H37MgCl/THF solution at positive potential. The formation of the pattern reflecting the shape of the photomask was confirmed by SEM observations.
Relation:	http://www.sciencedirect.com/science/journal/00220728
Type:	article (author version)
URI:	http://hdl.handle.net/2115/20537
Appears in Collections:	理学院・理学研究院 (Graduate School of Science / Faculty of Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 魚崎浩平

OAI-PMH ( junii2 , jpcoar_1.0 )

- Hokkaido University