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Double Zincate Pretreatment of Sputter-Deposited Al Films

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Title: Double Zincate Pretreatment of Sputter-Deposited Al Films
Authors: Azumi, Kazuhisa Browse this author →KAKEN DB
Yugiri, Takuma Browse this author
Seo, Masahiro Browse this author
Fujimoto, Shinji Browse this author
Issue Date: Jun-2001
Publisher: The Electrochemical Society
Journal Title: Journal of The Electrochemical Society
Volume: 148
Issue: 6
Start Page: C433
End Page: C438
Publisher DOI: 10.1149/1.1370966
Abstract: The characteristics of double zincate pretreatment of thin Al films deposited on glass plates using magnetron sputtering and ion-beam sputtering were investigated. Traces of Zn deposition and immersion potential as well as surface observations using scanning electron microscopy and atomic force microscopy showed that continuous dissolution of an Al film during the double zincate pretreatment occurred in the case of a magnetron sputter deposited film, resulting in Al film failure from the substrate. On the other hand, the substitution reaction of Al dissolution and Zn deposition occurring on the ion-beam sputter-deposited film ceased during the first and the second zincate treatment processes. The difference between the behaviors of the double zincate treatments for the two kinds of sputter-deposited films is related to the film structure. A magnetron sputter-deposited film has a columnar structure, resulting in higher susceptibility to the dissolution reaction in a concentrated alkaline zincate solution. On the other hand, an ion-beam sputter-deposited film has a fine microcrystalline structure with a low density of defects, resulting in lower susceptibility to the dissolution reaction. ©2001 The Electrochemical Society. All rights reserved.
Type: article
Appears in Collections:工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 安住 和久

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