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Metal induced gap states at alkali halide/metal interface

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Title: Metal induced gap states at alkali halide/metal interface
Authors: Kiguchi, Manabu Browse this author
Yoshikawa, Genki Browse this author
Ikeda, Susumu Browse this author
Saiki, Koichiro Browse this author
Keywords: Metal–insulator interfaces
Near-edge extended X-ray absorption fine structure
Alkali halides
Issue Date: 15-Oct-2004
Publisher: Elsevier B.V.
Journal Title: Applied Surface Science
Volume: 237
Issue: 1-4
Start Page: 495
End Page: 498
Publisher DOI: 10.1016/j.apsusc.2004.06.127
Abstract: The electronic state of a KCl/Cu(0 0 1) interface was investigated using the Cl K-edge near-edge X-ray absorption fine structure (NEXAFS). A pre-peak observed on the bulk edge onset of thin KCl films has a similar feature to the peak at a LiCl/Cu(0 0 1) interface, which originates from the metal induced gap state (MIGS). The present result indicates that the MIGS is formed universally at alkali halide/metal interfaces. The decay length of MIGS to an insulator differs from each other, mainly due to the difference in the band gap energy of alkali halide.
Type: article (author version)
Appears in Collections:理学院・理学研究院 (Graduate School of Science / Faculty of Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 木口 学

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