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無電解めっきと電気めっきによるセラミックス上への白金厚膜析出

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Title: 無電解めっきと電気めっきによるセラミックス上への白金厚膜析出
Other Titles: Thick Platinum Layer Deposition on Ceramics by Electroless- and Electro-plating
Authors: 菊地, 竜也1 Browse this author
渡辺, 健2 Browse this author
坂入, 正敏3 Browse this author →KAKEN DB
高橋, 英明4 Browse this author
丸子, 智弘5 Browse this author
Authors(alt): Kikuchi, Tatsuya1
Watanabe, Takeshi2
Sakairi, Masatoshi3
Takahashi, Hideaki4
Maruko, Tomohiro5
Keywords: Platinum
Electroless Plating
Electroplating
Issue Date: Jan-2008
Publisher: 表面技術協会
Journal Title: 表面技術
Volume: 59
Issue: 1
Start Page: 51
End Page: 56
Abstract: Thick platinum metal layer was deposited on ceramics using electroless- and electro-plating. The ceramics, which consist of ZrO2, Al2O3, SiO2, Na2O, and other oxides, were etched in HF solution, and then immersed in a platinum electroless plating solution containing Pt(NH3)2(NO2)2 and N2H4 as a reducting regent. The mass of the ceramics specimen slightly decreased with the electroless plating time and then in creased at a rate depending on temperature, but independent of Pt2+ concentration. Two μm thick platinum layer could be deposited uniformly on ceramics by electroless plating for 14.4ks at 323K. Electroplating of platinum in Pt(NH3)2(NO2)2 solution after electroless plating caused the formation of several tens μm thick platinum layer, and many cracks were formed on the platinum layer after long period of electro plating.
無電解めっきと電気めっきにより厚い白金金属層をセラミックス上に析出させた。ZrO2、Al2O3、SiO2、Na2O、および他の酸化物からなるセラミックスをHF水溶液中でエッチングしたのち、Pt(NH3)2(NO2)2および還元剤としてN2H4を含む白金無電解めっき溶液中に浸漬した。セラミックス試料の質量は、無電解めっき時間とともに若干減少したのち、温度に依存して一定速度で増加したが、Pt2+濃度には依存しなかった。323K、14.4ksの無電解めっきにより、2μmの厚さを有する白金層をセラミックス上に析出できた。無電解めっきののち、Pt(NH3)2(NO2)2溶液中での白金電気めっきにより、厚さ数10μmの白金層を形成できたが、めっき時間が長くなると白金層に多くのクラックが生成した。
Type: article (author version)
URI: http://hdl.handle.net/2115/34637
Appears in Collections:工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 菊地 竜也

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