DCプラズマCVD法による3次元基板上へのTiN膜生成 : アルゼンチン共和国へのプラズマプロセシング技術協力


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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/37585

Title:	DCプラズマCVD法による3次元基板上へのTiN膜生成 : アルゼンチン共和国へのプラズマプロセシング技術協力
Other Titles:	Deposition of TiN Film on the Three-Dimensional Substrate Using DC Plasma CVD Method : Technical Cooperation for Plasma Processing of Industrial Materials in the Argentine Republic
Authors:	下妻, 光夫¹ Browse this author →KAKEN DB
	Lasorsa, Carlos Browse this author
	Rodrigo, Adolfo Browse this author
Authors(alt):	Shimozuma, Mitsuo¹
Issue Date:	Dec-1995
Publisher:	北海道大学医療技術短期大学部
Journal Title:	北海道大学医療技術短期大学部紀要
Volume:	8
Start Page:	173
End Page:	182
Type:	bulletin (article)
URI:	http://hdl.handle.net/2115/37585
Appears in Collections:	北海道大学医療技術短期大学部紀要 > 第8号

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