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北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University >
No.140 >
「非晶質シリコン薄膜トランジスタのドレイン電流ドリフト特性とその機構」
Title: | 「非晶質シリコン薄膜トランジスタのドレイン電流ドリフト特性とその機構」 |
Other Titles: | Characterization and Mechanism of Drain Current Drift in Hydrogenated Amorphous Silicon Thin Film Transistor |
Authors: | 横山, 勇治1 Browse this author | 大野, 英男2 Browse this author →KAKEN DB | 長谷川, 英機3 Browse this author →KAKEN DB | 下妻, 光夫4 Browse this author →KAKEN DB |
Authors(alt): | Yokoyama, Yuji1 | Ohno, Hideo2 | Hasegawa, Hideki3 | Shimozuma, Mitsuo4 |
Issue Date: | 30-May-1988 |
Publisher: | 北海道大学 |
Journal Title: | 北海道大學工學部研究報告 |
Journal Title(alt): | Bulletin of the Faculty of Engineering, Hokkaido University |
Volume: | 140 |
Start Page: | 109 |
End Page: | 120 |
Type: | bulletin (article) |
URI: | http://hdl.handle.net/2115/42098 |
Appears in Collections: | 北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University > No.140
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