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In situ observation of self-organizing nanodot formation under nanosecond-pulsed laser irradiation on Si surface

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Title: In situ observation of self-organizing nanodot formation under nanosecond-pulsed laser irradiation on Si surface
Authors: WATANABE, S. Browse this author
YOSHIDA, Y. Browse this author
KAYASHIMA, S. Browse this author
YATSU, S. Browse this author
KAWAI, M. Browse this author
KATO, T. Browse this author
Keywords: diffusion
elemental semiconductors
high-speed optical techniques
laser materials processing
nanostructured materials
scanning electron microscopy
self-assembly
silicon
Issue Date: 2010
Publisher: American Institute of Physics
Journal Title: Journal of Applied Physics
Volume: 108
Issue: 10
Start Page: 103510-1
End Page: 103510-5
Publisher DOI: 10.1063/1.3512888
Abstract: An in situ observation of the formation of a laser-irradiation-induced nanodot array on a Si surface performed using a pulsed-laser-equipped high-voltage electron microscope (laser-HVEM). Under multiple nanosecond (ns) pulsed laser irradiation shots, atomic clusters were firrst formed and distributed on the surface in order to grow them epitaxially into protruded dots with diameters of ten nanometers or less. This is followed by their diffusion induced by successive laser shots to cannibalize and merge them into a ripple line with aligned, larger dots. We conclude that the present subwavelength two-dimensionally-ordered nanodot array is formed by self-organization under pulsed laser irradiation.
Rights: Copyright 2010 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
Relation: http://www.aip.org/
Type: article
URI: http://hdl.handle.net/2115/44285
Appears in Collections:工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

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