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Microstructure formation during the annealing of iron nitrides

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Title: Microstructure formation during the annealing of iron nitrides
Authors: Saito, R. Browse this author
Masubuchi, Y. Browse this author
Motohashi, T. Browse this author
Kikkawa, S. Browse this author
Sasaki, M. Browse this author
Keywords: Nitrides
Optical materials
Laser annealing
Sputtering
Issue Date: Apr-2011
Publisher: Elsevier
Journal Title: Materials Research Bulletin
Volume: 46
Issue: 4
Start Page: 547
End Page: 550
Publisher DOI: 10.1016/j.materresbull.2010.12.032
Abstract: The thermal metastability of iron nitride was exploited to fabricate thin-film microstructures applicable to left-handed metamaterials. A granular thin film containing dispersed iron particles was prepared by post-annealing an rf-sputter-deposited Fe0.5Al0.5N thin film with a wurtzite-type structure in a nitrogen atmosphere at 450℃. The obtained samples showed magnetic resonance in the microwave region. Laser direct writing was also applied in a nitrogen atmosphere to an rf-sputter-deposited Fe0.7Al0.3N thin film. 200 μm-wide, 300 Ωcm iron metal lines were drawn in a host nitride film of approximately 2 kΩcm. Combining and optimizing the above negative permeability and permittivity values should provide left-handed materials with a negative refractive index.
Type: article (author version)
URI: http://hdl.handle.net/2115/45260
Appears in Collections:工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 吉川 信一

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