Microstructure formation during the annealing of iron nitrides


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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/45260

Title:	Microstructure formation during the annealing of iron nitrides
Authors:	Saito, R. Browse this author
	Masubuchi, Y. Browse this author
	Motohashi, T. Browse this author
	Kikkawa, S. Browse this author
	Sasaki, M. Browse this author
Keywords:	Nitrides
	Optical materials
	Laser annealing
	Sputtering
Issue Date:	Apr-2011
Publisher:	Elsevier
Journal Title:	Materials Research Bulletin
Volume:	46
Issue:	4
Start Page:	547
End Page:	550
Publisher DOI:	10.1016/j.materresbull.2010.12.032
Abstract:	The thermal metastability of iron nitride was exploited to fabricate thin-film microstructures applicable to left-handed metamaterials. A granular thin film containing dispersed iron particles was prepared by post-annealing an rf-sputter-deposited Fe0.5Al0.5N thin film with a wurtzite-type structure in a nitrogen atmosphere at 450℃. The obtained samples showed magnetic resonance in the microwave region. Laser direct writing was also applied in a nitrogen atmosphere to an rf-sputter-deposited Fe0.7Al0.3N thin film. 200 μm-wide, 300 Ωcm iron metal lines were drawn in a host nitride film of approximately 2 kΩcm. Combining and optimizing the above negative permeability and permittivity values should provide left-handed materials with a negative refractive index.
Type:	article (author version)
URI:	http://hdl.handle.net/2115/45260
Appears in Collections:	工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 吉川信一

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