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Influence of growth temperature on growth of InGaAs nanowires in selective-area metal-organic vapor-phase epitaxy

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Title: Influence of growth temperature on growth of InGaAs nanowires in selective-area metal-organic vapor-phase epitaxy
Authors: Kohashi, Yoshinori Browse this author
Sato, Takuya Browse this author
Ikejiri, Keitaro Browse this author
Tomioka, Katsuhiro Browse this author →KAKEN DB
Hara, Shinjiroh Browse this author
Motohisa, Junichi Browse this author
Keywords: Nanostructures
Metal-organic vapor phase epitaxy
Selective epitaxy
Semiconducting III-V materials
Semiconducting ternary compounds
Issue Date: 1-Jan-2012
Publisher: Elsevier B.V.
Journal Title: Journal of Crystal Growth
Volume: 338
Issue: 1
Start Page: 47
End Page: 51
Publisher DOI: 10.1016/j.jcrysgro.2011.10.041
Abstract: Indium-rich InGaAs nanowires were grown on an InP (111)B substrate by catalyst-free selective-area metal-organic vapor phase epitaxy, and its growth-temperature dependence of growth rate and composition was studied. In particular, nanowire growth rate rapidly decreases as growth temperature increases. This tendency is opposite (for a similar temperature range) to that found in a previous study on selective-area growth of gallium-rich InGaAs nanowires. This difference between indium-rich and gallium-rich nanowires suggests that the influence of growth temperature on the growth of InGaAs nanowires is dependent on the group-III supply ratio. On the basis of previous experimental observations in InAs and GaAs nanowires, temperature dependence of nanowire growth rate and its dependence on group-III supply ratio are predicted. A guideline to determine the optimum growth conditions of InGaAs nanowires is also discussed.
Type: article (author version)
URI: http://hdl.handle.net/2115/48549
Appears in Collections:情報科学院・情報科学研究院 (Graduate School of Information Science and Technology / Faculty of Information Science and Technology) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 小橋 義典

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