HUSCAP logo Hokkaido Univ. logo

Hokkaido University Collection of Scholarly and Academic Papers >
Graduate School of Science / Faculty of Science >
Peer-reviewed Journal Articles, etc >

In Situ Optical and Electrochemical AFM Monitoring of Cu Electrodeposition Process on Bare and (NH4)2S-Treated p-GaAs(001) Surfaces

Files in This Item:
JES147-9_3356-3360.pdf316.34 kBPDFView/Open
Please use this identifier to cite or link to this item:

Title: In Situ Optical and Electrochemical AFM Monitoring of Cu Electrodeposition Process on Bare and (NH4)2S-Treated p-GaAs(001) Surfaces
Authors: Tamura, Kazuhisa Browse this author
Kondo, Toshihiro Browse this author
Uosaki, Kohei Browse this author →KAKEN DB
Issue Date: 2000
Publisher: The Electrochemical Society
Journal Title: Journal of The Electrochemical Society
Volume: 147
Issue: 9
Start Page: 3356
End Page: 3360
Publisher DOI: 10.1149/1.1393906
Abstract: The initial process of Cu electrodeposition on bare and (NH4)2S-treated p-GaAs(001) surfaces was investigated using electro-chemical, reflectance, light-scattering, and in situ electrochemical atomic force microscopy (AFM) measurements. The reflectance and light-scattering measurements showed that on both the bare and (NH4)2S-treated surfaces, Cu deposition occurred in a cluster growth mode and the Cu clusters grew in the z-direction at a relatively negative potential where the limiting current was observed. The potential dependencies of the reflectance and scattered light intensity obtained at various potential scan rates showed that the size of the Cu clusters was smaller at the higher scan rate. The charge due to the Cu deposition at the (NH4)2S-treated electrode was nearly half that of the bare surface under the same experimental conditions, and AFM images showed a smaller number of Cu clusters at the (NH4)2S-treated surfaces, suggesting a reduction in the defect sites by the (NH4)2S treatment.
Rights: © The Electrochemical Society, Inc. 2000. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). The archival version of this work was published in J. Electrochem. Soc. 2000 volume 147, issue 9, 3356-3360.
Type: article
Appears in Collections:理学院・理学研究院 (Graduate School of Science / Faculty of Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 魚崎 浩平

Export metadata:

OAI-PMH ( junii2 , jpcoar_1.0 )

MathJax is now OFF:


 - Hokkaido University