日本企業の中国における特許出願に関する再考


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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/51540

Title:	日本企業の中国における特許出願に関する再考
Authors:	張, 星源 Browse this author
Authors:	中田, 喜文 Browse this author
Issue Date:	Sep-2012
Publisher:	北海道大学グローバルCOEプログラム「多元分散型統御を目指す新世代法政策学」事務局, 北海道大学情報法政策学研究センター
Journal Title:	知的財産法政策学研究
Journal Title(alt):	Intellectual Property Law and Policy Journal
Volume:	39
Start Page:	133
End Page:	156
Type:	bulletin (article)
URI:	http://hdl.handle.net/2115/51540
Appears in Collections:	知的財産法政策学研究 = Intellectual Property Law and Policy Journal > vol.39

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