HUSCAP logo Hokkaido Univ. logo

Hokkaido University Collection of Scholarly and Academic Papers >
Graduate School of Information Science and Technology / Faculty of Information Science and Technology >
Peer-reviewed Journal Articles, etc >

The Observation of “Conduction Spot” on NiO Resistance Random Access Memory

Files in This Item:
2nd-Revised-Kondo-Takahashi-11-3-8.pdf5.85 MBPDFView/Open
Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/52264

Title: The Observation of “Conduction Spot” on NiO Resistance Random Access Memory
Authors: Kondo, Hirofumi Browse this author
Arita, Masashi Browse this author
Fujii, Takashi Browse this author
Kaji, Hiromichi Browse this author
Moniwa, Masahiro Browse this author
Yamaguchi, Takeshi Browse this author
Fujiwara, Ichiro Browse this author
Yoshimaru, Masaki Browse this author
Takahashi, Yasuo Browse this author
Issue Date: Aug-2011
Publisher: Japan Society of Applied Physics
Journal Title: Japanese Journal of Applied Physics
Volume: 50
Issue: 8
Start Page: 081101
Publisher DOI: 10.1143/JJAP.50.081101
Abstract: We succeeded in observing the “conduction spot” (CS) in the capacitor structure resistance random access memory (ReRAM), which includes a conductive filament. In this study, we used NiO prepared by thermal oxidation at a high temperature as 800 °C. It requires a forming process using an extra high voltage, which partly removes the top electrode from the resistance switched area. These experiments enabled us to observe the conductive filament directly in CS on NiO ReRAM by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). From SEM images, CSs seem to be produced by some kind of breakdown, but we confirmed the reproducible resistance switching at least 50 cycles after the CS generation. By energy dispersive X-ray spectroscopy (EDX) with TEM observations, drastic oxygen reduction was observed in a local area within CS of NiO films. Moreover, the CS area depended on the injection power for forming. These experimental data suggest that the miniaturization of ReRAM will be achieved by reducing the injection power for forming.
Rights: © 2011 The Japan Society of Applied Physics
Type: article (author version)
URI: http://hdl.handle.net/2115/52264
Appears in Collections:情報科学院・情報科学研究院 (Graduate School of Information Science and Technology / Faculty of Information Science and Technology) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 有田 正志

Export metadata:

OAI-PMH ( junii2 , jpcoar_1.0 )

MathJax is now OFF:


 

 - Hokkaido University