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Formation and electric property measurement of nanosized patterns of tantalum oxide by current sensing atomic force microscope

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Title: Formation and electric property measurement of nanosized patterns of tantalum oxide by current sensing atomic force microscope
Authors: Kim, Young-ho Browse this author
Zhao, Jianwei Browse this author
Uosaki, Kohei3 Browse this author →KAKEN DB
Authors(alt): 魚崎, 浩平3
Issue Date: 15-Dec-2003
Publisher: American Institute of Physics
Journal Title: Journal of Applied Physics
Volume: 94
Issue: 12
Start Page: 7733
End Page: 7738
Publisher DOI: 10.1063/1.1627951
Abstract: Nanosized patterns of tantalum oxide were fabricated on a tantalum substrate by applying a potential pulse utilizing current sensing atomic force microscopy (CSAFM). The dimensions of the dots were strongly dependent on the bias applied, scan rate, and potential pulse duration. By controlling these variables, the minimum size nanodots with full width at half maximum of 35 nm was achieved. Immediately after pattern formation, the electrical properties of the Ta oxide nanodots were measured using CSAFM. The charge transport at the CSAFM tip and the nanosized Ta oxide dot can be described by Poole–Frenkel type conduction. The relative dielectric constant of the nanosized Ta2O5 dots was calculated to be 17.8–24.3, showing that the quality of the oxide was high. In addition, by controlling the substrate bias applied, pulse duration, and tip scan speed, nanosized Ta oxide lines with the desired dimensions were prepared.
Rights: Copyright © 2003 American Institute of Physics
Relation: http://www.aip.org/
Type: article
URI: http://hdl.handle.net/2115/5602
Appears in Collections:理学院・理学研究院 (Graduate School of Science / Faculty of Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 魚崎 浩平

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