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Hokkaido University Collection of Scholarly and Academic Papers >
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In situ x-ray photoelectron spectroscopy for electrochemical reactions in ordinary solvents
| Title: | In situ x-ray photoelectron spectroscopy for electrochemical reactions in ordinary solvents |
| Authors: | Masuda, Takuya Browse this author | | Yoshikawa, Hideki Browse this author | | Noguchi, Hidenori Browse this author | | Kawasaki, Tadahiro Browse this author | | Kobata, Masaaki Browse this author | | Kobayashi, Keisuke Browse this author | | Uosaki, Kohei Browse this author →KAKEN DB |
| Issue Date: | 9-Sep-2013 |
| Publisher: | American Institute of Physics |
| Journal Title: | Applied Physics Letters |
| Volume: | 103 |
| Issue: | 11 |
| Start Page: | 111605 |
| Publisher DOI: | 10.1063/1.4821180 |
| Abstract: | In situ electrochemical X-ray photoelectron spectroscopy (XPS) apparatus, which allows XPS at solid/liquid interfaces under potential control, was constructed utilizing a microcell with an ultra-thin Si membrane, which separates vacuum and a solution. Hard X-rays from a synchrotron source penetrate into the Si membrane surface exposed to the solution. Electrons emitted at the Si/solution interface can pass through the membrane and be analyzed by an analyzer placed in vacuum. Its operation was demonstrated for potential-induced Si oxide growth in water. Effect of potential and time on the thickness of Si and Si oxide layers was quantitatively determined at sub-nanometer resolution. |
| Rights: | Copyright 2013 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Appl. Phys. Lett. 103, 111605, 2013, and may be found at http://dx.doi.org/10.1063/1.4821180 |
| Type: | article |
| URI: | http://hdl.handle.net/2115/59735 |
| Appears in Collections: | 理学院・理学研究院 (Graduate School of Science / Faculty of Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)
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Submitter: 魚崎 浩平
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