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Formation of oxide films for high-capacitance aluminum electrolytic capacitor by liquid-phase deposition and anodizing

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タイトル: Formation of oxide films for high-capacitance aluminum electrolytic capacitor by liquid-phase deposition and anodizing
著者: Sakairi, Masatoshi 著作を一覧する
Fujita, Ryota 著作を一覧する
Nagata, Shinji 著作を一覧する
キーワード: dielectric film
liquid-phase deposition
anodizing
aluminum
titanium oxide
発行日: 2016年 8月
出版者: Wiley-Blackwell
誌名: Surface and Interface Analysis
巻: 48
号: 8
開始ページ: 899
終了ページ: 905
出版社 DOI: 10.1002/sia.5851
抄録: Liquid phase deposition (LPD) treatment and anodizing were used to form oxide layer for a high-capacitance aluminum electrolytic capacitor. Formation of protective oxide layers and modification of LPD conditions make it possible to prolong the LPD duration and lead to the formation of TiO2 and NaF deposits on aluminum. A titanium oxide / aluminum oxide mixed layer was formed by a combination process of LPD treatment and anodizing. The capacitance of the formed layer was about 300% higher than that of an anodic oxide film formed on electropolished aluminum. The structures and compositions of the films that were formed were determined by transmission electron microscopy, scanning electron microscopy, and Rutherford backscattering spectroscopy.
Rights: This is the peer reviewed version of the following article: Surface and interface analysis, 48(8), August 2016, pp.899-905, which has been published in final form at http://onlinelibrary.wiley.com/doi/10.1002/sia.5851/full. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving.
資料タイプ: article (author version)
URI: http://hdl.handle.net/2115/66901
出現コレクション:雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

提供者: 坂入 正敏

 

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