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Surface-related operation instabilities of GaN HEMTs and their control using Al2O3-based MOS structures [an abstract of dissertation and a summary of dissertation review]

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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/70526
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Title: Surface-related operation instabilities of GaN HEMTs and their control using Al2O3-based MOS structures [an abstract of dissertation and a summary of dissertation review]
Other Titles: GaN HEMTにおける表面起因の動作不安定性とAl2O3 MOS構造による制御 [論文内容及び審査の要旨]
Authors: 西口, 賢弥 Browse this author
Issue Date: 22-Mar-2018
Publisher: Hokkaido University
Conffering University: 北海道大学
Degree Report Number: 甲第13083号
Degree Level: 博士
Degree Discipline: 工学
Examination Committee Members: (主査) 教授 本久 順一, 教授 葛西 誠也, 特任教授 佐野 栄一, 教授 橋詰 保
Degree Affiliation: 情報科学研究科(情報エレクトロニクス専攻)
Rights: https://creativecommons.org/licenses/by-nc-sa/4.0/
Type: theses (doctoral - abstract and summary of review)
URI: http://hdl.handle.net/2115/70526
Appears in Collections:学位論文 (Theses) > 博士 (工学)
課程博士 (Doctorate by way of Advanced Course) > 情報科学院(Graduate School of Information Science and Technology)

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