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Improvement of Oxidation Resistance of NbSi2 by Addition of Boron

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Title: Improvement of Oxidation Resistance of NbSi2 by Addition of Boron
Authors: Kurokawa, Kazuya Browse this author →KAKEN DB
Yamauchi, Akira2 Browse this author
Matsushita, Shinya Browse this author
Authors(alt): 山内, 啓2
Keywords: Niobium disilicide
oxidation behavior
oxide scale
addition of boron
improvement of oxidation resistance
Issue Date: 2005
Publisher: Trans Tech Publications Inc.
Journal Title: Materials Science Forum
Volume: 502
Start Page: 243
End Page: 248
Abstract: NbSi2 is a promising candidate as a coating material for Nb-base alloys. However, it shows complicated oxidation behavior, depending on oxidation temperature. In the present study, in order to clarify the oxidation resistance of NbSi2, oxidation tests of sintered NbSi2 were carried out at temperatures ranging from 773 to 1673 K in air. Moreover, the effect of addition of boron on oxidation resistance of NbSi2 was clarified. NbSi2 showed accelerated oxidation at temperatures of 1073 K and above. The accelerated oxidation was caused by formation of a porous oxide layer, which may be due to the phase transformation from amorphous to crystalline SiO2. The addition of boron to NbSi2 leads to the formation of a protective borosilicate layer, resulting in great improvement of the oxidation resistance. Consequently, NbSi2 added with boron shows excellent oxidation resistance up to at least 1673 K.
Type: article (author version)
Appears in Collections:エネルギー・マテリアル融合領域研究センター (Center for Advanced Research of Energy and Material) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 山内 啓

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