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Interface control of Al2O3-based insulated-gate structures for high-frequency GaN HEMTs [an abstract of dissertation and a summary of dissertation review]

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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/74171
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Title: Interface control of Al2O3-based insulated-gate structures for high-frequency GaN HEMTs [an abstract of dissertation and a summary of dissertation review]
Other Titles: Al2O3絶縁ゲート構造の界面制御と高周波GaN HEMTへの応用 [論文内容及び審査の要旨]
Authors: 尾崎,史朗1 Browse this author
Authors(alt): Ozaki, Shiro1
Issue Date: 25-Mar-2019
Publisher: Hokkaido University
Conffering University: 北海道大学
Degree Report Number: 甲第13513号
Degree Level: 博士
Degree Discipline: 工学
Examination Committee Members: (主査) 教授 本久 順一, 教授 葛西 誠也, 准教授 佐藤 威友
Degree Affiliation: 情報科学研究科(情報エレクトロニクス専攻)
Rights: https://creativecommons.org/licenses/by-nc-sa/4.0/
Type: theses (doctoral - abstract and summary of review)
URI: http://hdl.handle.net/2115/74171
Appears in Collections:課程博士 (Doctorate by way of Advanced Course) > 情報科学院(Graduate School of Information Science and Technology)
学位論文 (Theses) > 博士 (工学)

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