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Formation of Nanoporous Anodic Oxide Films on Ti-Al Microchannel Walls

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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/74638

Title: Formation of Nanoporous Anodic Oxide Films on Ti-Al Microchannel Walls
Authors: Ishida, Masashi Browse this author
Ohmi, Tatsuya Browse this author →KAKEN DB
Sakairi, Masatoshi Browse this author →KAKEN DB
Iguchi, Manabu Browse this author
Keywords: Microchannel
Powder Metallurgy
Infiltration
Anodic Oxidation
Titanium-Aluminum Alloy
Issue Date: 2010
Publisher: 日本実験力学会
Journal Title: 実験力学
Journal Title(alt): Journal of JSEM
Volume: 10
Issue: Special Issue
Start Page: 210
End Page: 214
Publisher DOI: 10.11395/jjsem.11.s210
Abstract: Fabrication of a nanoporous anodic oxide film on the inner wall of a microchannel was experimented. The microchannel was produced in a titanium body by a powder-metallurgical microchanneling process and was lined with a Ti-Al alloy layer. We found an appropriate anodic condition for an exposed planner surface of the Ti-Al alloy layer. In the case of the microchannel, the growth of the nanoporous oxide film tended to retard deep inside the channel. This problem was easily solved by lengthening the anodic oxidation time
Rights: 著作権は日本実験力学会にある。利用は著作権の範囲内に限られる
Type: article
URI: http://hdl.handle.net/2115/74638
Appears in Collections:工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 大参 達也

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