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Bicyclic Topology Transforms Self-Assembled Nanostructures in Block Copolymer Thin Films
| Title: | Bicyclic Topology Transforms Self-Assembled Nanostructures in Block Copolymer Thin Films |
| Authors: | Ree, Brian J. Browse this author | | Satoh, Yusuke Browse this author | | Isono, Takuya Browse this author | | Satoh, Toshifumi Browse this author →KAKEN DB |
| Keywords: | topological block copolymers | | phase separated nanostructures | | topological alteration | | thin film morphology | | unidirectional orientation | | grazing incidence | | X-ray scattering |
| Issue Date: | 9-Sep-2020 |
| Publisher: | American Chemical Society |
| Journal Title: | Nano letters |
| Volume: | 20 |
| Issue: | 9 |
| Start Page: | 6520 |
| End Page: | 6525 |
| Publisher DOI: | 10.1021/acs.nanolett.0c02268 |
| Abstract: | Ongoing efforts in materials science have resulted in linear block copolymer systems that generate nanostructures via the phase separation of immiscible blocks; however, such systems are limited with regard to their domain miniaturization and lack of orientation control. We overcome these limitations through the bicyclic topological alteration of a block copolymer system. Grazing incidence X-ray scattering analysis of nanoscale polymer films revealed that bicyclic topologies achieve 51.3-72.8% reductions in domain spacing when compared against their linear analogue, which is more effective than the theoretical predictions for conventional cyclic topologies. Moreover, bicyclic topologies achieve unidirectional orientation and a morphological transformation between lamellar and cylindrical domains with high structural integrity. When the near-equivalent volume fraction between the blocks is considered, the formation of hexagonally packed cylindrical domains is particularly noteworthy. Bicyclic topological alteration is therefore a powerful strategy for developing advanced nanostructured materials for microelectronics, displays, and membranes. |
| Rights: | This document is the Accepted Manuscript version of a Published Work that appeared in final form in Nano Letters, copyright c American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/doi/10.1021/acs.nanolett.0c02268, see http://pubs.acs.org/page/policy/articlesonrequest/index.html]. |
| Type: | article (author version) |
| URI: | http://hdl.handle.net/2115/82632 |
| Appears in Collections: | 工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)
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Submitter: 佐藤 敏文
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