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Healing Sulfur Vacancies in Monolayer MoS2 by High-Pressure Sulfur and Selenium Annealing: Implication for High-Performance Transistors

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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/83045

Title: Healing Sulfur Vacancies in Monolayer MoS2 by High-Pressure Sulfur and Selenium Annealing: Implication for High-Performance Transistors
Authors: Yanase, Takashi Browse this author
Uehara, Fumiya Browse this author
Naito, Itsuki Browse this author
Nagahama, Taro Browse this author →KAKEN DB
Shimada, Toshihiro Browse this author →KAKEN DB
Keywords: high-pressure annealing
MoS2
S vacancies
photoluminescence
chemical vapor deposition
monolayer
Issue Date: 23-Oct-2020
Publisher: American Chemical Society
Journal Title: ACS Applied Nano Materials
Volume: 3
Issue: 10
Start Page: 10462
End Page: 10469
Publisher DOI: 10.1021/acsanm.0c02385
Abstract: Developing a technology to terminate chalcogen vacancies for transition-metal dichalcogenides is a crucial task for applications, such as transistors, diodes, and sensors, because chalcogen vacancies degrade the electronic and optical properties. This article reports a healing method of S vacancies in MoS2 by high-pressure annealing under a S vapor pressure of 5 atm. The crystal quality after mechanical transfer, S annealing, and vacuum annealing was systematically studied by observing the photoluminescence (PL). The remarkable recovery of the A-exciton emission peak in the PL spectrum indicated repair of the crystal quality in MoS2 by the S annealing. We also demonstrated that the S vacancies could be terminated by Se atoms using a high-pressure annealing method. The crystal quality of MoS2(1-x)Se2x alloys was confirmed by transmission electron microscopy and electron diffraction.
Rights: This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Applied Nano Materials, copyright c American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see http://doi.org/10.1021/acsanm.0c02385.
Type: article (author version)
URI: http://hdl.handle.net/2115/83045
Appears in Collections:工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 柳瀬 隆

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