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High-repetition-rate (6 kHz) and long-pulse-duration (50 ns) ArF excimer laser for sub-65 nm lithography

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タイトル: High-repetition-rate (6 kHz) and long-pulse-duration (50 ns) ArF excimer laser for sub-65 nm lithography
著者: Kakizaki, Koji 著作を一覧する
Sasaki, Yoichi 著作を一覧する
Inoue, Toyoharu 著作を一覧する
Sakai, Yosuke 著作を一覧する
発行日: 2006年 3月
出版者: American Institute of Physics
誌名: Review of Scientific Instruments
巻: 77
号: 3
開始ページ: 035109-1
終了ページ: 035109-6
出版社 DOI: 10.1063/1.2182744
抄録: Development of high-repetition-rate ArF excimer lasers is vital requirement for achieving high throughput and high energy-dose stability in a scanner system. ArF excimer laser, with increasing light pulse duration, can reduce the peak power without the energy-dose change. Then, the spectral bandwidth ΔλFWHM becomes narrower by increasing the number of light round trips in a cavity, and optical damage is reduced from high-peak power. Laser operation exceeding 4 kHz is needed for next-generation technologies that can enable high numerical aperture and development of high-throughput scanners. In the present work, we examined the possibilities of achieving a repetition rate to 6 kHz from 4 kHz in the ArF laser the authors developed, taking the following innovations. The spatial width of discharge region was reduced by about 30%. The uniform gas flow condition between the electrodes was obtained by improving gas flow guides. As a result, we have obtained an average power of 42 W, a standard deviation for pulse-to-pulse energy of 3.5%, and an integral-square pulse width Tis of 44 ns at 6 kHz for ΔλFWHM<0.40 pm. Finally, it was concluded that developing a 6 kHz ArF excimer laser for the next-generation sub-65 nm lithography is feasible.
Rights: Copyright © 2006 American Institute of Physics
Relation (URI):
資料タイプ: article
出現コレクション:雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

提供者: 酒井 洋輔


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