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Influence of Topological Confinement on Nanoscale Film Morphologies of Tricyclic Block Copolymers
Title: | Influence of Topological Confinement on Nanoscale Film Morphologies of Tricyclic Block Copolymers |
Authors: | Ree, Brian J. Browse this author | Satoh, Yusuke Browse this author | Isono, Takuya Browse this author | Satoh, Toshifumi Browse this author →KAKEN DB |
Keywords: | tricyclic block copolymers | various tricyclic topologies | synchrotron grazing incidence X-ray scattering | nanoscale film morphologies | structural parameters | exceptionally small domain spacing |
Issue Date: | 11-May-2021 |
Publisher: | American Chemical Society |
Journal Title: | Macromolecules |
Volume: | 54 |
Issue: | 9 |
Start Page: | 4120 |
End Page: | 4127 |
Publisher DOI: | 10.1021/acs.macromol.1c00214 |
Abstract: | This study is the first quantitative synchrotron grazing incidence X-ray scattering investigation of nanoscale film morphologies of tricyclic block copolymers based on poly (n-decyl glycidyl ether) (PDGE) and poly (2-(2-(2-methoxyethoxy)-ethoxy)ethyl glycidyl ether) (PTEGGE) blocks in equivalent volume fractions. Both PDGE and PTEGGE blocks of the tricyclic block copolymers are amorphous, but copolymers exhibit phase-separated lamellar nanostructures due to block immiscibility. The lamellar structures vary in their structural parameters such as lamellar orientation and structural integrity stability depending on the degree of topological confinement effect taking effect. Interestingly, sub-10 nm domain spacings are established by all nanostructures, which are remarkably shorter than that of the linear analogue. These exceptionally short domain spacings are evident that the tricyclic block copolymer approach is highly efficient for developing high-performance nanolithographic materials for future advanced semiconductor applications. |
Rights: | This document is the Accepted Manuscript version of a Published Work that appeared in final form in Macromolecules, copyright © American Chemical Society after peer review and echnical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/articlesonrequest/AOR-YVBIAZJIWJH973BYQYDQ. |
Type: | article (author version) |
URI: | http://hdl.handle.net/2115/84949 |
Appears in Collections: | 工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)
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Submitter: 佐藤 敏文
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