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Sweet Pluronic poly(propylene oxide)-b-oligosaccharide block copolymer systems : Toward sub-4 nm thin-film nanopattern resolution

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Title: Sweet Pluronic poly(propylene oxide)-b-oligosaccharide block copolymer systems : Toward sub-4 nm thin-film nanopattern resolution
Authors: Mumtaz, Muhammad Browse this author
Takagi, Yasuko Browse this author
Mamiya, Hiroaki Browse this author
Tajima, Kenji Browse this author →KAKEN DB
Bouilhac, Cecile Browse this author
Isono, Takuya Browse this author
Satoh, Toshifumi Browse this author →KAKEN DB
Borsali, Redouane Browse this author
Keywords: Block copolymer
Microphase separation
Thin film
Issue Date: 5-Jul-2020
Publisher: Elsevier
Journal Title: European polymer journal
Volume: 134
Start Page: 109831
Publisher DOI: 10.1016/j.eurpolymj.2020.109831
Abstract: Block copolymers (BCPs) with a high Flory-Huggins interaction parameter (chi) are promising alternatives to conventional nanopatterning materials for future nanolithography and nanotechnology applications. Herein, we described AB- and ABA-type BCPs comprising oligosaccharides (maltoheptaose, maltotriose, and maltose as the A block) and poly(propylene oxide) (PPO, as the B block) as new high-chi BCP systems, which can be termed "Sweet Pluronics". The BCPs were successfully synthesized by click reaction between azido-functionalized PPO and propargyl-functionalized maltooligosaccharides. These BCPs undergo microphase separation in bulk state to provide various nanopatterns, i.e., sub-4 nm nanofeatures (cylinders, lamellae, and spheres) with domain spacing as low as 6.2 nm, depending on their composition and the applied annealing conditions. The thin film of these BCPs fabricated on a silicon substrate also showed various microphase-separated structures. When the BCP thin films were subjected to high-temperature solvent vapor annealing using a mu-wave oven as the heating source, their morphologies changed from parallel lamellar to cylindrical because of the preferential swelling of PPO. Overall, these results confirmed that the present "Sweet Pluronics" system is promising high-chi materials for sub-4 nm nanopatterning applications.
Rights: ©2020. This manuscript version is made available under the CC-BY-NC-ND 4.0 license
Type: article (author version)
Appears in Collections:工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 磯野 拓也

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