Uniaxially oriented nickel aluminum superalloy films sputtered with in situ heating

Phuoc Toan Tran; Hai Dang Ngo; Thien Duc Ngo; Nagao, Tadaaki

doi:10.35848/1882-0786/ac0ecd


Hokkaido University \| Library \| HUSCAP	Advanced Search		言語

	Home
	About HUSCAP
	Open Access Policy

	Browse by Author

Browse
	Communities & Collections

	Scholarly Journals
	Theses
	Doctoral Dissertations Listed by Graduate Schools
	Conference Procs.
	Events

	HUSCAP Senior (in Japanese)

	Societies

	Downloads (country)

For university staff
	How to post your papers to HUSCAP
	Publication of theses
	Helpline about theses publication

Open Archives Compliant

You can search our collection also at:
	Google
	Google Scholar
	CiNii
	IRDB
	OAIster
	NDLTD

Hokkaido University Collection of Scholarly and Academic Papers >
Graduate School of Science / Faculty of Science >
Peer-reviewed Journal Articles, etc >

Uniaxially oriented nickel aluminum superalloy films sputtered with in situ heating

This item is licensed under:Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International

Files in This Item:

Appl. Phys. Express 14-8 087001.pdf

1.02 MB

PDF

View/Open

Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/86440

Title:	Uniaxially oriented nickel aluminum superalloy films sputtered with in situ heating
Authors:	Phuoc Toan Tran Browse this author
	Hai Dang Ngo Browse this author
	Thien Duc Ngo Browse this author
	Nagao, Tadaaki Browse this author →KAKEN DB
Keywords:	Nickel aluminum superalloy
	Thin-film growth
	Plasmonic film
	Photothermal device
Issue Date:	Aug-2021
Publisher:	IOP Publishing
Journal Title:	Applied Physics Express (APEX)
Volume:	14
Issue:	8
Start Page:	087001
Publisher DOI:	10.35848/1882-0786/ac0ecd
Abstract:	We report uniaxially oriented nickel aluminum (NiAl) films grown by DC magnetron sputtering under in situ heating. The films self-organize in (110) orientation with relatively low surface roughness and tight grain boundaries in columnar structure. The electrical carrier concentration and resistivity are on the order of 10(21) cm(-3) and 10(-5) omega center dot cm, respectively. The plasmonic performance, as indicated by the dielectric function, is comparable to that of a NiAl single crystal and exceeds those of conventional refractory materials (molybdenum, tungsten, titanium nitride) at visible to NIR wavelengths. This work paves the way to superalloy-based plasmonic nanostructures for photothermal energy applications.
Rights:	© 2021 The Japan Society of Applied Physics
Rights:	http://creativecommons.org/licenses/by-nc-nd/4.0/
Type:	article (author version)
URI:	http://hdl.handle.net/2115/86440
Appears in Collections:	理学院・理学研究院 (Graduate School of Science / Faculty of Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 長尾忠昭

OAI-PMH ( junii2 , jpcoar_1.0 )

- Hokkaido University