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Uniaxially oriented nickel aluminum superalloy films sputtered with in situ heating

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Title: Uniaxially oriented nickel aluminum superalloy films sputtered with in situ heating
Authors: Phuoc Toan Tran Browse this author
Hai Dang Ngo Browse this author
Thien Duc Ngo Browse this author
Nagao, Tadaaki Browse this author →KAKEN DB
Keywords: Nickel aluminum superalloy
Thin-film growth
Plasmonic film
Photothermal device
Issue Date: Aug-2021
Publisher: IOP Publishing
Journal Title: Applied Physics Express (APEX)
Volume: 14
Issue: 8
Start Page: 087001
Publisher DOI: 10.35848/1882-0786/ac0ecd
Abstract: We report uniaxially oriented nickel aluminum (NiAl) films grown by DC magnetron sputtering under in situ heating. The films self-organize in (110) orientation with relatively low surface roughness and tight grain boundaries in columnar structure. The electrical carrier concentration and resistivity are on the order of 10(21) cm(-3) and 10(-5) omega center dot cm, respectively. The plasmonic performance, as indicated by the dielectric function, is comparable to that of a NiAl single crystal and exceeds those of conventional refractory materials (molybdenum, tungsten, titanium nitride) at visible to NIR wavelengths. This work paves the way to superalloy-based plasmonic nanostructures for photothermal energy applications.
Rights: © 2021 The Japan Society of Applied Physics
Type: article (author version)
Appears in Collections:理学院・理学研究院 (Graduate School of Science / Faculty of Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 長尾 忠昭

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