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Tailored copper oxidation in alkaline aqueous solution after helium cation implantation

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Title: Tailored copper oxidation in alkaline aqueous solution after helium cation implantation
Authors: Yang, Subing Browse this author
Nakagawa, Yuki Browse this author
Shibayama, Tamaki Browse this author →KAKEN DB
Keywords: Helium ion implantation
Copper oxidation
Copper oxide nanostructure
Issue Date: 30-Jun-2022
Publisher: Elsevier
Journal Title: Applied surface science
Volume: 591
Start Page: 153087
Publisher DOI: 10.1016/j.apsusc.2022.153087
Abstract: Manipulating Cu oxidation is important for Cu anti-oxidation techniques and Cu oxide fabrication. In this study, Cu oxidation behavior after He+ implantation was observed after exposure to 0.1 M aqueous NaOH, and the underlying microstructural evolution and mechanism were investigated. He+ implantation and some C concomitantly introduced into the Cu surface accelerated formation of a thin oxide layer during the initial oxidation period, resulting in faster initial generation and more rapid growth of CuO during the subsequent oxidation. Furthermore, He+ implantation homogenized the distribution of CuO on the Cu substrate. Our findings will increase researchers' understanding of the oxidation and corrosion behavior of Cu in aqueous alkaline conditions, and provide new insights into designing and growing Cu oxide nanostructures by ion implantation.
Rights: © <2022>. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/
http://creativecommons.org/licenses/by-nc-nd/4.0/
Type: article (author version)
URI: http://hdl.handle.net/2115/91330
Appears in Collections:エネルギー・マテリアル融合領域研究センター (Center for Advanced Research of Energy and Material) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 柴山 環樹

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