HUSCAP logo Hokkaido Univ. logo

Hokkaido University Collection of Scholarly and Academic Papers >

Sort by: In order: Results/Page Authors/Record:
Export metadata:
Showing results 1 to 3 of 3
TypeAuthor(s)TitleOther TitlesCitationCitation(alt)Issue Date
articleUemura, Keisuke; Deki, Manato; Honda, Yoshio; Amano, Hiroshi; Sato, TaketomoEffect of photoelectrochemical etching and post-metallization annealing on gate controllability of AlGaN/GaN high electron mobility transistors-Japanese Journal of Applied Physics (JJAP)-1-Jun-2019
article (author version)Sato, Taketomo; Toguchi, Masachika; Komatsu, Yuto; Uemura, KeisukeLow-Damage Etching for AlGaN/GaN HEMTs Using Photo-Electrochemical Reactions-IEEE transactions on semiconductor manufacturing-Nov-2019
articleKumazaki, Yusuke; Uemura, Keisuke; Sato, Taketomo; Hashizume, TamotsuPrecise thickness control in recess etching of AlGaN/GaN hetero-structure using photocarrier-regulated electrochemical process-Journal of Applied Physics-14-May-2017
Showing results 1 to 3 of 3


Hokkaido University