Micromagnetic simulation of magnetization reversal process and stray field behavior in Fe thin film wire


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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/32350

Title:	Micromagnetic simulation of magnetization reversal process and stray field behavior in Fe thin film wire
Authors:	Ohno, Munekazu Browse this author
Authors:	Yoh, Kanji Browse this author →KAKEN DB
Issue Date:	28-Dec-2007
Publisher:	American Institute of Physics
Journal Title:	Journal of Applied Physics
Volume:	102
Issue:	12
Start Page:	123908
Publisher DOI:	10.1063/1.2821731
Abstract:	The magnetization reversal process of Fe thin film wire is studied based on two-dimensional micromagnetic simulation. It is demonstrated that the external field parallel to the width direction results in the formation of a 180 degrees Neel wall, whereas the field applied to the thickness direction yields the Bloch-like walls, which turn into C-type walls in the residual state. These behaviors are explained by the anisotropic dependence of wall energy in the direction of the external field. The stray field during this process is analyzed in detail.
Rights:	Copyright (c) 2007 American Institute of Physics
Relation:	http://www.aip.org/
Type:	article
URI:	http://hdl.handle.net/2115/32350
Appears in Collections:	量子集積エレクトロニクス研究センター (Research Center for Integrated Quantum Electronics) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 陽完治

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