Strong Pressure Effect in the Sublimation from Tetracene Single Crystals and Development of Surface Cleaning Technique for Organic Semiconductors


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Title:	Strong Pressure Effect in the Sublimation from Tetracene Single Crystals and Development of Surface Cleaning Technique for Organic Semiconductors
Authors:	Ohtomo, Manabu Browse this author
	Itaka, Kenji Browse this author
	Hasegawa, Tetsuya Browse this author
	Shimada, Toshihiro Browse this author →KAKEN DB
Keywords:	tetracene single crystals
	surface cleaning technique
	organic semiconductors
	microscopic sublimation behavior
Issue Date:	2011
Publisher:	The Japan Society of Applied Physics
Journal Title:	Applied Physics Express
Volume:	4
Issue:	2
Start Page:	021601-1
End Page:	021601-3
Publisher DOI:	10.1143/APEX.4.021601
Abstract:	We studied the sublimation of tetracene single crystals under vacuum and 1 atm inert gas to develop the surface cleaning technique for organic semiconductors. It was found that the microscopic sublimation behavior is strongly dependent on the gas pressure. Nanometer-scale roughening was observed after heating in vacuum, and layer-by-layer sublimation was observed under 1 atm Ar gas. Reflection high energy electron diffraction analysis of the topmost surface showed streak patterns, indicating that surface contaminants were successfully removed.
Rights:	© 2011 The Japan Society of Applied Physics
Type:	article
URI:	http://hdl.handle.net/2115/44910
Appears in Collections:	工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 島田敏宏

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