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Fabrication of semiconductor Kagome lattice structure by selective area metalorganic vapor phase epitaxy

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Title: Fabrication of semiconductor Kagome lattice structure by selective area metalorganic vapor phase epitaxy
Authors: Mohan, Premila Browse this author
Nakajima, Fumito Browse this author
Akabori, Masashi Browse this author
Motohisa, Junichi4 Browse this author →KAKEN DB
Fukui, Takashi Browse this author →KAKEN DB
Authors(alt): 本久, 順一4
Issue Date: 28-Jul-2003
Publisher: American Institute of Physics
Journal Title: Applied Physics Letters
Volume: 83
Issue: 4
Start Page: 689
End Page: 691
Publisher DOI: 10.1063/1.1593823
Abstract: Artificial two-dimensional semiconductor Kagome lattice structures formed by quantum wires can show ferromagnetism when the flatband is half filled, even though it does not have any magnetic elements. Experimental realization of such a Kagome lattice structure is reported. The structure, with different pattern periods, was formed with GaAs quantum wires by selective area metalorganic vapor phase epitaxy on GaAs (111)B substrates. To overcome the lateral overgrowth and to improve the shape of smaller period pattern, flow rate modulation epitaxy was employed and a GaAs Kagome lattice structure with 1 μm period was effectively grown.
Rights: Copyright © 2003 American Institute of Physics
Relation: http://www.aip.org/
Type: article
URI: http://hdl.handle.net/2115/5519
Appears in Collections:量子集積エレクトロニクス研究センター (Research Center for Integrated Quantum Electronics) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 本久 順一

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