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SIMSによる高純度銅中の微量金属不純物の定量分析
| Title: | SIMSによる高純度銅中の微量金属不純物の定量分析 |
| Other Titles: | Quantitative SIMS Analysis of Trace Metallic Impurities in High Purity Copper |
| Authors: | 竹下, 博之1 Browse this author | | 香川, 卓也2 Browse this author | | 鈴木, 亮輔3 Browse this author →KAKEN DB | | 大石, 敏雄4 Browse this author | | 小野, 勝敏5 Browse this author |
| Authors(alt): | Takeshita, Hiroyuki T.1 | | Kagawa, Takuya2 | | Suzuki, Ryosuke O.3 | | Oishi, Toshio4 | | Ono, Katsutoshi5 |
| Keywords: | secondary ion mass spectrometry | | impurity in copper | | quantitative analysis | | high resolution analysis | | isotopic abundance |
| Issue Date: | 1-Mar-1996 |
| Publisher: | 日本金属学会 |
| Journal Title: | 日本金属学会誌 |
| Journal Title(alt): | Journal of the Japan Institute of Metals |
| Volume: | 60 |
| Issue: | 3 |
| Start Page: | 290 |
| End Page: | 294 |
| Publisher DOI: | 10.2320/jinstmet1952.60.3_290 |
| Abstract: | Quantitative analysis of trace amounts of dominant impurities in copper, Ag, Fe, Ni and Pb, were studied using secondary ion mass spectrometry (SIMS). Based on the survey of the secondary ions species, which disturbed the detection of atomic ions of impurities, the removal of these disturbance is proposed as the two methods; applying the high resolution of mass spectrometry, and calculating the isotopic abundance. The precision, detection limit and relative sensitivity factor were experimentally discussed to establish the reliable quantitative SIMS analysis at the local area of high purity copper. |
| Type: | article |
| URI: | http://hdl.handle.net/2115/74869 |
| Appears in Collections: | 工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)
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Submitter: 鈴木 亮輔
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