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J. Jpn. Inst. Met. 60(3) 290.pdf553.86 kBPDFView/Open
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Title: SIMSによる高純度銅中の微量金属不純物の定量分析
Other Titles: Quantitative SIMS Analysis of Trace Metallic Impurities in High Purity Copper
Authors: 竹下, 博之1 Browse this author
香川, 卓也2 Browse this author
鈴木, 亮輔3 Browse this author →KAKEN DB
大石, 敏雄4 Browse this author
小野, 勝敏5 Browse this author
Authors(alt): Takeshita, Hiroyuki T.1
Kagawa, Takuya2
Suzuki, Ryosuke O.3
Oishi, Toshio4
Ono, Katsutoshi5
Keywords: secondary ion mass spectrometry
impurity in copper
quantitative analysis
high resolution analysis
isotopic abundance
Issue Date: 1-Mar-1996
Publisher: 日本金属学会
Journal Title: 日本金属学会誌
Journal Title(alt): Journal of the Japan Institute of Metals
Volume: 60
Issue: 3
Start Page: 290
End Page: 294
Publisher DOI: 10.2320/jinstmet1952.60.3_290
Abstract: Quantitative analysis of trace amounts of dominant impurities in copper, Ag, Fe, Ni and Pb, were studied using secondary ion mass spectrometry (SIMS). Based on the survey of the secondary ions species, which disturbed the detection of atomic ions of impurities, the removal of these disturbance is proposed as the two methods; applying the high resolution of mass spectrometry, and calculating the isotopic abundance. The precision, detection limit and relative sensitivity factor were experimentally discussed to establish the reliable quantitative SIMS analysis at the local area of high purity copper.
Type: article
Appears in Collections:工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 鈴木 亮輔

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