Hokkaido University Collection of Scholarly and Academic Papers >
Research Center for Integrated Quantum Electronics >
Peer-reviewed Journal Articles, etc >
Fabrication of InP/InAs/InP core-multishell heterostructure nanowires by selective area metalorganic vapor phase epitaxy
Title: | Fabrication of InP/InAs/InP core-multishell heterostructure nanowires by selective area metalorganic vapor phase epitaxy |
Authors: | Mohan, Premila Browse this author | Motohisa, Junichi Browse this author | Fukui, Takashi Browse this author |
Issue Date: | 27-Mar-2006 |
Publisher: | American Institute of Physics |
Journal Title: | Applied Physics Letters |
Volume: | 88 |
Start Page: | 133105 |
Publisher DOI: | 10.1063/1.2189203 |
Abstract: | We report the growth of InP/InAs/InP core-multishell nanowire arrays by selective area metalorganic vapor phase epitaxy. The core-multishell nanowires were designed to accommodate a strained InAs quantum well layer in a higher band gap InP nanowire. The precise control over nanowire growth direction and heterojunction formation enabled the successful fabrication of the nanostructure in which all three layers were epitaxially grown without the assistance of any catalyst. The grown nanowires were highly uniform, vertically oriented, and periodically aligned with controllable dimensions. 4 K photoluminescence measurements confirmed the formation of strained InAs quantum well on InP (110) sidewalls and the well widths corresponding to the photoluminescence peaks were in good agreement with calculated values. |
Rights: | Copyright © 2006 American Institute of Physics. |
Relation: | http://apl.aip.org/ |
Type: | article |
URI: | http://hdl.handle.net/2115/8416 |
Appears in Collections: | 量子集積エレクトロニクス研究センター (Research Center for Integrated Quantum Electronics) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)
|
Submitter: 本久 順一
|