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TypeAuthor(s)TitleOther TitlesCitationCitation(alt)Issue Date
article (author version)Sato, Taketomo; Kaneshiro, Chinami; Hasegawa, HidekiThe Strong Correlation between Interface Microstructure and Barrier Height in Pt/n-InP Schottky Contacts Formed by an In Situ Electrochemical Process-Japanese Journal of Applied Physics. Pt. 1, Regular papers, short notes & review papers-Feb-1999
articleHashizume, Tamotsu; Ootomo, Shinya; Hasegawa, HidekiSuppression of current collapse in insulated gate AlGaN/GaN heterostructure field-effect transistors using ultrathin Al2O3 dielectric-Applied Physics Letters-6-Oct-2003
article (author version)Kasai, Seiya; Han, Weihua; Yumoto, Miki; Hasegawa, HidekiTeraheltz Response of Schottky Wrap Gate-Controlled Quantum Dots-Physica Status Solidi. C. Current Topics in Solid State Physics-26-Jun-2003
bulletin (article)Hasegawa, HidekiTheory of Carrier Waves Along Semiconductor-Insulator Boundaries-北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University7-Dec-1976
article (author version)Suzuki, Tadaki; Orba, Yasuko; Makino, Yoshinori; Okada, Yuki; Sunden, Yuji; Hasegawa, Hideki; Hall, William W.; Sawa, HirofumiViroporin activity of the JC polyomavirus is regulated by interactions with the adaptor protein complex 3-Proceedings of the National Academy of Sciences of the United States of America-12-Nov-2013
bulletin (article)下妻, 光夫; 長谷川, 英機; 田頭, 博昭アルゴン-シランと窒素-シラン混合ガスのグロー放電発光スペクトルEmission Spectrum of the Glow Discharge in Argon-Silane and Nitrogen-Silane Mixtures北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University31-Oct-1983
bulletin (article)菊地, 強; 大野, 英男; 長谷川, 英機ショットキー電極を用いたIN0.53Ga0.47As金属-半導体-金属フォトダイオードIn0.53Ga0.47As Metal-semiconductor-metal Photodiode Using Schottky Contact北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University29-Jul-1988
bulletin (article)大植, 英司; 赤沢, 正道; 児玉, 聡; 長谷川, 英機シリコン超薄膜を用いたInGaAsの表面不活性化とその応用A New Surface Passivation Method of InGaAs Using a Si Ultrathin Layer and Its Application北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University20-Jul-1991
bulletin (article)岩穴, 忠義; 藤倉, 序章; 長谷川, 英機フォトルミネセンス法によるInGaAS細線の評価Charactorization of InGaAs Wires by Photoluminescence北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University29-Jul-1994
bulletin (article)西本, 陽一郎; 斉藤, 俊也; 長谷川, 英機フォトルミネセンス法によるシリコン表面の表面再結合速度の評価Measurement of Surface Recombination Velocity of Si Surface by Photoluminescence Method北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University28-May-1993
bulletin (article)樋口, 恵一; 後藤, 修; 福井, 孝志; 長谷川, 英機原子層エピタキシ法によるInAs/GaAs量子井戸の形成と評価The Fabrication and Properties of InAs/GaAs Quantum Wells by ALE北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University27-May-1992
bulletin (article)後藤, 修; 樋口, 恵一; 長谷川, 英機原子層エピタキシ法によるInAs,GaAs薄膜の形成と量子井戸および障壁構造の製作Atomic Layer Epitaxy Growth of InAs and GaAs Thin Films and Fabrication of Quantum Wells and Barriers北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University24-May-1991
bulletin (article)矢野, 仁之; 大野, 英男; 長谷川, 英機; 沢田, 孝幸光伝導法による半絶縁性InP基板の評価Characterization of Semi-Insulating InP Substrates by Photo-Conductance Measurement北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University31-Jul-1987
bulletin (article)小島, 清明; 長谷川, 英機高抵抗率半導体結晶の成長条件についてGrowth Conditions of High-Resistivity Semiconductor Crystals北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University31-Oct-1980
bulletin (article)高橋, 平七郎; 柴山, 環樹; 長谷川, 英樹; 大野, 英男高分解能電子顕微鏡による化合物半導体/酸化絶縁膜界面構造の観察Observation of Interfaces of Compound Semiconductors by High Resolution Electron Microscope北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University30-Sep-1988
bulletin (article)田中, 利広; 石井, 敦司; 萩田, 晃一; 大野, 英男; 長谷川, 英機高融点金属ゲートを用いたセルフアライン形InP MISFETの製作プロセスの検討Fabrication Process of Self-Aligned InP MISFETs Using Refractory Metal Gates北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University29-Jul-1988
bulletin (article)廣瀬, 達哉; 松崎, 賢一郎; 駱, 季奎; 大野, 英男; 長谷川, 英機選択ドープAlGaAs/GaAsヘテロ構造における2次元電子の磁気抵抗効果Magnetoresistance of Two Dimensional Electron Gas in AlGaAs/GaAs Selectively Doped Hetrero Structures北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University31-May-1989
bulletin (article)岸田, 基也; 熊倉, 一英; 中越, 一彰; 山崎, 高宏; 本久, 順一; 福井, 孝志; 長谷川, 英機選択成長によるGaAs及びAlGaAs立体構造の作製と評価Fabrication and Characterization of GaAs and AlGaAs Micro-Pyramids by Selective MOCVD北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University29-Jul-1994
bulletin (article)工藤, 潤一; 長谷川, 英機; 大野, 英男; 飯塚, 浩一超高速GaAs集積回路における配線の信号伝送特性の解析 : 配線抵抗の効果Signal Propagation Characteristics of Interconnect in GaAs Ultra High Speed Integrated Circuits : Effect of Interconnect Resistance北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University30-May-1988
bulletin (article)有本, 智; 金澤, 裕; 原, 毅彦; 大野, 英男; 長谷川, 英機等温過渡容量法 (ICTS) によるアモルファスSi MIS構造の評価Characterization of Interface Properties in an Amorphous Silicon Metal Insulator Semiconductor Structure by Isothermal Capacitance Transient Spectroscopy北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University31-Jul-1985
Showing results 61 to 80 of 89
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