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TypeAuthor(s)TitleOther TitlesCitationCitation(alt)Issue Date
article (author version)Hasegawa, Hideki; Kasai, SeiyaHexagonal Binary Decision Diagram Quantum Logic Circuits Using Schottky In-Plane and Wrap Gate Control of GaAs and InGaAs Nanowires-Physica E: Low-dimensional Systems and Nanostructures-Oct-2001
article (author version)Kasai, Seiya; Neguro, Noboru; Hasegawa, HidekiConductance Gap Anomaly in Scanning Tunneling Spectra of MBE-Grown (001) Surfaces of III-V Compound Semiconductors-Applied Surface Science-15-May-2001
article (author version)Kasai, Seiya; Hasegawa, HidekiGaAs-Based Single Electron Transistors and Logic Inverters Utilizing Schottky Wrap-Gate Controlled Quantum Wires and Dots-Japanese Journal of Applied Physics. Pt. 1, Regular papers, short notes & review papers-Mar-2001
article (author version)Sato, Taketomo; Kasai, Seiya; Hasegawa, HidekiCurrent transport and capacitance-voltage characteristics of GaAs and InP nanometer-sized Schottky contacts formed by in situ electrochemical process-Applied Surface Science-2001
article (author version)Sato, Taketomo; Kasai, Seiya; Okada, Hiroshi; Hasegawa, HidekiElectrical Properties of Nanometer-Sized Schottky Contacts on n-GaAs and n-InP Formed by in Situ Electrochemical Process-Japanese Journal of Applied Physics. Pt. 1, Regular papers, short notes & review papers-Jul-2000
proceedings (author version)Kasai, Seiya; Amemiya, Yoshihito; Hasegawa, HidekiGaAs Schottky Wrap-Gate Binary-Decision-Diagram Devices for Realization of Novel Single Electron Logic Architecture---2000
article (author version)Kasai, Seiya; Satoh, Yoshihiro; Hasegawa, HidekiConductance Oscillation Characteristics of GaAs Schottky Wrap-Gate Single Electron Transistors-Physica B: Condensed Matter-1-Dec-1999
article (author version)Sato, Taketomo; Kaneshiro, Chinami; Okada, Hiroshi; Hasegawa, HidekiFormation of Size- and Position-Controlled Nanometer Size Pt Dots on GaAs and InP Substrates by Pulsed Electrochemical Deposition-Japanese Journal of Applied Physics. Pt. 1, Regular papers, short notes & review papers-Apr-1999
article (author version)Sato, Taketomo; Kaneshiro, Chinami; Hasegawa, HidekiThe Strong Correlation between Interface Microstructure and Barrier Height in Pt/n-InP Schottky Contacts Formed by an In Situ Electrochemical Process-Japanese Journal of Applied Physics. Pt. 1, Regular papers, short notes & review papers-Feb-1999
article (author version)Kaneshiro, Chinami; Sato, Taketomo; Hasegawa, HidekiElectrochemical Etching of Indium Phosphide Surfaces Studied by Voltammetry and Scanned Probe Microscopes-Japanese Journal of Applied Physics. Pt. 1, Regular papers, short notes & review papers-Feb-1999
article (author version)Kasai, Seiya; Jinushi, Kei-ichiroh; Tomozawa, Hidemasa; Hasegawa, HidekiFabrication and Characterization of GaAs Single Electron Devices Having Single and Multiple Dots Based on Schottky In-Plane-Gate and Wrap-Gate Control of Two-Dimensional Electron Gas-Japanese Journal of Applied Physics. Pt. 1, Regular papers, short notes & review papers-Mar-1997
article (author version)Kasai, Seiya; Hashizume, Tamotsu; Hasegawa, HidekiElectron Beam Induced Current Characterization of Novel GaAs Quantum Nanostructures Based on Potential Modulation of Two-Dimensional Electron Gas by Schottky In-Plane Gates-Japanese Journal of Applied Physics. Pt. 1, Regular papers, short notes & review papers-Dec-1996
article (author version)Kasai, Seiya; Hasegawa, HidekiFabrication and Characterization of Novel Lateral Surface Superlattice Structure Utilizing Schottky Barrier Height Control by Doped Silicon Interface Control Layers-Japanese Journal of Applied Physics. Pt. 1, Regular papers, short notes & review papers-Feb-1996
bulletin (article)佐々木, 恵二; 赤沢, 正道; 塩原, 俊助; 長谷川, 英機半絶縁性基板の表面電気伝導および表面不活性化Electrical Conduction Near Surface of Semi-Insulating Substrate and Its Surface Passivation北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University29-Jul-1994
bulletin (article)岸田, 基也; 熊倉, 一英; 中越, 一彰; 山崎, 高宏; 本久, 順一; 福井, 孝志; 長谷川, 英機選択成長によるGaAs及びAlGaAs立体構造の作製と評価Fabrication and Characterization of GaAs and AlGaAs Micro-Pyramids by Selective MOCVD北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University29-Jul-1994
bulletin (article)岩穴, 忠義; 藤倉, 序章; 長谷川, 英機フォトルミネセンス法によるInGaAS細線の評価Charactorization of InGaAs Wires by Photoluminescence北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University29-Jul-1994
bulletin (article)西本, 陽一郎; 斉藤, 俊也; 長谷川, 英機フォトルミネセンス法によるシリコン表面の表面再結合速度の評価Measurement of Surface Recombination Velocity of Si Surface by Photoluminescence Method北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University28-May-1993
bulletin (article)樋口, 恵一; 後藤, 修; 福井, 孝志; 長谷川, 英機原子層エピタキシ法によるInAs/GaAs量子井戸の形成と評価The Fabrication and Properties of InAs/GaAs Quantum Wells by ALE北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University27-May-1992
bulletin (article)大植, 英司; 赤沢, 正道; 児玉, 聡; 長谷川, 英機シリコン超薄膜を用いたInGaAsの表面不活性化とその応用A New Surface Passivation Method of InGaAs Using a Si Ultrathin Layer and Its Application北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University20-Jul-1991
bulletin (article)後藤, 修; 樋口, 恵一; 長谷川, 英機原子層エピタキシ法によるInAs,GaAs薄膜の形成と量子井戸および障壁構造の製作Atomic Layer Epitaxy Growth of InAs and GaAs Thin Films and Fabrication of Quantum Wells and Barriers北海道大學工學部研究報告Bulletin of the Faculty of Engineering, Hokkaido University24-May-1991
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